Advanced Series in Physical Chemistry - Vol. 12
CHEMICAL APPLICATIONS OF SYNCHROTRON RADIATION
Part I: Dynamics and VUV Spectroscopy
Part II: X-Ray Applications
edited by Tsun-Kong Sham (University of Western Ontario, Canada)
Contents (45k)
Preface (40k)
Introduction (15k)
Chapter 1: Photodissociation and Reaction Dynamics Studies Using Third-Generation Synchrotron Radiation
Chapter 1.1: Introduction (97k)
Chapter 1.2: Experimental (565k)
Chapter 1.3: Photochemistry
Chapter 1.3.1: Dimethyl Sulfoxide (451k)
Chapter 1.3.2: Substituted Ethylenes (4,046k)
Chapter 1.3.3: Oxalyl Chloride (1,036k)
Chapter 1.3.4: Propyne and Allene (69k)
Chapter 1.4: Reactive Scattering (1,590k)
Chapter 1.5: Conclusion (104k)
The synchrotron light source is becoming widely available, after its evolution from its infancy in the sixties to the present third generation source with insertion devices. It is timely to examine the impact that synchrotron light has made and will continue to make on chemical research. With this objective in mind, the editor of this invaluable book invited contributions from practitioners who are in the forefront of the research. The book summarizes most of the significant developments in the last decade in chemical and related research using synchrotron light. The utilization of the light as a probe as well as an energy source is emphasized.
This book is organized into two parts, in order of increasing photon energy. Part I deals with the applications of low energy photons and covers areas such as gas phase photodissociation reactions and dynamics, soft X-ray fluorescence, IR and photoemission analysis of surfaces, spectroscopy of organic and polymeric materials, catalysts, electronic and magnetic materials, and spectromicroscopy. Part II encompasses applications using soft to hard X-rays, including spectroscopy of surface and thin films, XAFS, diffraction and scattering, and several technological applications, namely the microprobe, photoetching and tribology.
Contents:
- Part I:
- Spectroscopy and Dynamics of Molecular
Superexcited Molecules (Y Hatano)
- Photoionization Dynamics from Inner-Shell Mass-Spectrometry (A P Hitchcock & J J Neville)
- Surface Science and Microscopy Investigations Using Infrared Synchrotron Radiation (P Dumas & G P Williams)
- Functional Organic Materials Studied Using UPS and NEXAFS (K Seki et al.)
- Electronic and Magnetic Materials (F J Himpsel)
- Part II:
- Soft X-ray Excited Optical Luminescence Spectroscopies (A Rogalev & J Goulon)
- Recent Advances in Powder Diffraction (J S Tse)
- Higher Order Multiple Scattering Theory of XAFS (J J Rehr et al.)
- and other papers
Readership: Physical chemists and materials scientists.
"The material is presented in a clear, concise and authoritative manner and each chapter contains figures that complement the text, together with a comprehensive list of relevant references ... This text is essential for library purchase and, for those engaged in this field of research and/or teaching graduate courses that cover the chemical applications of synchrotron radiation, personal purchase is recommended."
| Journal of Synchrotron Radiation |
"Overall, this is an excellent survey of the many applications of synchrotron radiation in all areas of modern chemistry and related disciplines, and it is highly recommended, both to active researchers interested in expanding their use of synchrotron techniques as well as to graduate students and others entering the field."
| Journal of the American Chemical Society |
| 1304pp |
Pub. date: Jun 2002 |
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