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AN INTRODUCTION TO PHYSICS AND TECHNOLOGY OF THIN FILMS
by Alfred Wagendristel (Tech. Univ. Vienna) & Yuming Wang (Jilin Univ.)
Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics — ferromagnetic films, diffusion in thin films and mechanical properties of thin films — are discussed.
Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.
Contents:
- Part I:
- Thin Film Deposition Methods
- Theories of
Nucleation and Film Growth
- Control and Measurement of Film Thickness
- Electrical Conduction in Thin Films
- Dielectric Properties of Thin Insulator Films
- Superconducting Films
- Semiconducting Films
- Part II:
- Thin Ferromagnetic Films
- Diffusion in Thin Films
- Mechanical Properties of Thin Films
- References
- Index
Readership: Materials scientists.
"This book discuss mainly the systems of deposited thin films on a substrate ... The book is mainly focused on the processes in film formation and the microstructural properties such as amorphous, polycrystalline and single crystalline films ... The book is very handy in the thin film laboratory when one need to find quickly some answers on the most relevant questions around the subjects mentioned above."
| 160pp |
Pub. date: Sept 1994 |
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