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INFRARED CHARACTERIZATION FOR MICROELECTRONICS
by W S Lau (Chartered Semiconductor Manufacturing Limited, Singapore)
Most of the books on infrared characterization are for applications in chemistry and no book has been dedicated to infrared characterization for microelectronics. The focus of the book will be on practical applications useful to the production line and to the research and development of microelectronics. The background knowledge and significance of doing a particular type of infrared measurement will be discussed in detail. The principal purpose of the book is to serve as a useful handbook for practising engineers and scientists in the field of microelectronics.
Contents:
- Introduction to Infrared Spectroscopy
- The Properties of Infrared
Transparent Substrates
- The Measurement of Oxygen and Carbon and Other Impurities in Silicon
- The Measurement of Epitaxial Layer Thickness
- The Characterization of Silicon Dioxide and Silicon Nitride Thin Films
- The Characterization of PSG, BPSG, SOG and Other Glasses
- The Characterization of Amorphous Silicon and Related Materials
- Miscellaneous Applications of Infrared Spectroscopy to Microelectronics
Readership: Materials scientists and engineers.
| 172pp |
Pub. date: Oct 1999 |
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