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    SILICIDES: FUNDAMENTALS AND APPLICATIONS
    Proceedings of the 16th Course of the International School of Solid State Physics
    Erice, Italy, 5 – 16 June 1999

    edited by Leo Miglio (University of Milano-Bicocca, Italy) & Francois d'Heurle (IBM, Yorktown Heights)

    Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications.

    The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.

     
    Contents:
    • Crystal Chemistry of Metal Silicides (R Madar)
    • Bonding and Polymorphism in Transition Metal Disilicides (L Miglio et al.)
    • Diffusion in Silicides: Basic Approach and Practical Applications (P Gas & F M d'Heurle)
    • Silicides and Thermodynamics (C Bernard & A Pisch)
    • Optical Properties of Silicides: Theory and Experiment (V Antonov & F Marabelli)
    • Fundamental Electronic Properties of Semiconducting Silicides (V Borisenko)
    • Semiconducting Silicides — Thermoelectric Properties and Applications (A Heinrich)
    • Metallic Silicides (G Ottaviani)
    • The Kinetics of Reactive Phase Formation: Silicides (F M d'Heurle)
    • Reactive Phase Formation in Binary and Ternary Silicide Systems (A A Kodentsov et al.)
    • Epitaxial Silicides (H von Känel)
    • Ion Beam Synthesis, Molecular Beam Allotaxy and Self-Assembled Patterning of Epitaxial Silicides (S Mantl)
    • Silicides: Materials Science and Applications for Microelectronics (K Maex & A Lauwers)
    • The Changing Views on the Schottky Barrier (R Tung)
    • Metal Rich Structural Silicides (A J Thom et al.)
    • and several other papers on more topical subjects
     
    Readership: Researchers in applied physics, condensed matter physics, and electrical & electronic engineering.
     
     
    388pp    Pub. date: Dec 2000  
    ISBN:   978-981-02-4452-1
    981-02-4452-5
       US$162 / £107

     


    388pp    Pub. date: Dec 2000  
    ISBN:   978-981-279-213-6(ebook)
    981-279-213-9(ebook)
       US$211

     


     

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    Updated on 14 February 2012