edited by Boris Luk'yanchuk (Data Storage Institute, Agency for Science, Technology and Research, Singapore)

About the Editor

Boris Luk'yanchuk is Hononary Professor at Johannes Kepler University (Linz, Austria) and is a Member of Technical Staff at the Data Storage Institute of the National University of Singapore. He has published 4 monographs and more than 160 research papers.

Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, and for the cleaning of micro-optical and micro-mechanical components.

This invaluable book presents the mechanics of the cleaning processes, experimental results, and different applications, including laser cleaning of art. It contains review articles by leading specialists in laser cleaning who participated in the 1st International Workshop on Laser Cleaning, held in Singapore in 2001.

• History:
  • The Road to “Steam Laser Cleaning” (W Zapka)
• Dry Laser Cleaning:
  • Dry Laser Cleaning of Particles by Nanosecond Pulses: Theory (N Arnold)
  • Optical Resonance and Near-Field Effects in Dry Laser Cleaning (B S Luk`yanchuk et al.)
• Steam Laser Cleaning:
  • Pulsed Laser Cleaning of Particles from Surfaces and Optical Materials (D M Kane et al.)
  • Liquid-Assisted Pulsed Laser Cleaning with Near Infrared and Ultraviolet-Pulsed Lasers (C P Grigoropoulos & D Kim)
  • Steam Laser Cleaning of Silicon Wafers: Laser Induced Bubble Nucleation and Efficiency Measurements (P Leiderer et al.)
  • Physical Mechanisms of Laser Cleaning (V P Veiko & E A Shakhno)
• Laser Cleaning of Artworks:
  • Laser Ablation in Cleaning of Artworks (V Zafiropulos)
  • On the Theory of Discoloration Effect in Pigments at Laser Cleaning (B S Luk`yanchuk & V Zafiropulos)
• Applications of Laser Cleaning:
  • Cleaning for Field Emitter Arrays (M Takai)
  • Laser Cleaning of Organic Contamination on Microelectronic Devices and Process Real-Time Monitoring (M H Hong et al.)